Vacuum Magnetron Sputtering Coating Machine

Vacuum Magnetron Sputtering Coating Machine

SPECIFICATIONS

TOB-1100X-SPC-16M magnetron sputtering coater utilizes the sputtering effect produced by particle bombardment of the target material in a vacuum environment, which makes the target material atoms or molecules shoot out from the solid surface, and the process of forming a thin film is deposited on the substrate. Belongs to the physical vapor deposition (PVD) preparation of thin film technology. TOB-1100X-SPC-16M magnetron sputter coater can be used for the preparation of scanning electron microscope samples in the laboratory, and the compact size of the equipment saves space in the laboratory; the operation is simple and suitable for beginners to use.

Features

• It is equipped with vacuum meter and sputtering current meter, which can monitor the working status in real time.
• By adjusting the sputtering current controller and micro vacuum gas valve, it controls the vacuum chamber pressure, ionization current and selects the required ionization gas to obtain the best coating effect.
• The rubber sealing ring on the edge of the bell housing is specially designed to ensure that the glass bell housing will not be chipped in long-term use.
• Ceramic-sealed high-voltage electrode fittings are more durable than the rubber seals normally used.
• According to the ionization characteristics of the gas in the electric field, a large-capacity sputtering vacuum chamber and a corresponding area of the sputtering target are used to make the sputtered layer more uniform and pure.
• The sputter head utilizes Peltier cooling technology to obtain high performance, fine particle coatings.
• Water-cooled sputter heads and water-cooled carrier tables are available.

PRODUCT DISPLAY

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